Fineceratech's Yttrium Oxide (Y₂O₃) Ceramic Chamber Covers are specially designed for use in high-temperature and corrosive environments, where superior thermal resistance and chemical stability are crucial. Y₂O₃ is known for its exceptional resistance to molten metals, plasma, and corrosive gases, making it ideal for applications in semiconductor manufacturing, chemical processing, and other demanding industrial processes. These chamber covers offer outstanding durability, thermal stability, and resistance to wear and chemical attack.
- Yttrium oxide ceramics can withstand temperatures up to 2200°C, making them ideal for high-temperature environments such as vacuum chambers and plasma etching processes.
- Y₂O₃ ceramics are highly resistant to corrosive gases, molten metals, and reactive chemicals, ensuring long-lasting performance in aggressive environments.
- These chamber covers are highly resistant to plasma damage, making them suitable for use in semiconductor processing, where exposure to corrosive plasma and gases is common.
- The low coefficient of thermal expansion minimizes the risk of thermal stress, making the ceramic chamber cover ideal for high-temperature applications where thermal cycling is frequent.
- Y₂O₃ ceramics provide superior electrical insulation, even at high temperatures, making them suitable for processes where electrical isolation is critical.
- These ceramic covers are highly resistant to wear and erosion, ensuring long service life even in abrasive or harsh conditions.
- Fineceratech ensures that each Y₂O₃ ceramic chamber cover is manufactured with precision, ensuring a perfect fit and optimal performance in specific industrial applications.
- Used in semiconductor manufacturing equipment, including plasma etching and deposition systems, where high resistance to plasma, heat, and corrosive gases is required.
- Suitable for use in vacuum chambers and furnaces where high thermal resistance and low contamination are critical for high-purity processes.
- Ideal for chemical reactors and processing systems that involve aggressive chemical environments and high temperatures.
- Employed in metal refining and processing applications, where resistance to molten metals and corrosive atmospheres is crucial.
- Suitable for high-precision processes in optoelectronics and display manufacturing, where the reliability and purity of materials are essential.
- Density: 5.01 g/cm³
- Thermal Conductivity: 12-15 W/mK
- Operating Temperature Range: Up to 2200°C
- Coefficient of Thermal Expansion: 8 x 10⁻⁶/K
- Electrical Resistivity: >10¹⁴ Ω·cm at room temperature
- Plasma Resistance: Excellent against plasma etching and deposition processes
- Chemical Resistance: Highly resistant to acids, alkalis, and corrosive gases
- Dimensions: Customizable to meet specific application requirements
- Enhanced Process Efficiency: Superior thermal conductivity and low thermal expansion minimize thermal stress, improving the efficiency and reliability of high-temperature processes.
- Reliable Protection: The chamber cover provides excellent protection against wear, erosion, and chemical attack, ensuring the safety and integrity of the process environment.
- Cost Efficiency: Durability and long-lasting performance reduce the frequency of replacements, leading to lower maintenance and operational costs.
- Custom Design and Fit: Fineceratech offers customizable solutions to meet the exact requirements of your application, ensuring seamless integration and optimal performance.